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Publication Citation: Formation of Shallow Junctions During Rapid Thermal Processing from Electron-Beam Deposited Boron Sources

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Author(s): W Zagozdzon-wosik; K Korablev; I Rusakova; David S. Simons; J H. Shi; P Chi; J C. Wolfe;
Title: Formation of Shallow Junctions During Rapid Thermal Processing from Electron-Beam Deposited Boron Sources
Published: December 01, 1996
Abstract:
Citation: Journal of the Electrochemical Society
Volume: 143
Pages: pp. 2981 - 2989
Research Areas: Nanotechnology, Chemistry