Publication Citation
NIST Authors in Bold
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| Author(s): | W Zagozdzon-wosik; K Korablev; I Rusakova; David S. Simons; J H. Shi; P Chi; J C. Wolfe; |
|---|---|
| Title: | Formation of Shallow Junctions During Rapid Thermal Processing from Electron-Beam Deposited Boron Sources |
| Published: | December 01, 1996 |
| Abstract: | |
| Citation: | Journal of the Electrochemical Society |
| Volume: | 143 |
| Pages: | pp. 2981 - 2989 |
| Research Areas: | Nanotechnology, Chemistry |