Semiconductors Programs/Projects in EEEL

Loading 12” wafer containing state-of-the-art CMOS devices into a probe station in preparation of making high-speed measurements of transient changes in device characteristics due to temperature-bias stress. 

Loading 12” wafer containing state-of-the-art CMOS devices into a probe station in preparation of making high-speed measurements of transient changes in device characteristics due to temperature-bias stress.

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