Frontiers of Characterization and Metrology for Nanoelectronics

View presentations from the 2009 Conference!

The 2009 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (formerly titled Characterization and Metrology for ULSI Technology) was held the week of May 11-15, 2009, at the College of Nanoscale Science and Engineering, University at Albany, Albany, New York. This conference, the seventh in the series, focused on the frontiers and innovation in characterization and metrology of nanoelectronics.

Committee Co-Chairs

• David Seiler, NIST
• Alain Diebold, College of Nanoscale Science and Engineering, SUNY Albany
• Bob McDonald, Technology Associates (Treasurer)
• Mike Garner, Intel
• Dan Herr, SRC
• Rajinder Khosla, NSF

Committee Members

• Caroline Ayre, Numonyx
• Harold Bloess, Qimonda
• Alexander Braun, Semiconductor International
• Amal Chabli, LETI
• Michael Current, Frontier Semiconductor
• Dick Hockett, Evans Analytical Group LLC
• Toshihiko Kanayama, AIST
• David Kyser, Applied Materials
• Shifeng Lu, Micron
• Ulrich Mantz, Zeiss
• Lori S. Nye, Brewer Science, Inc.
• Yaw Obeng, NIST
• Sandip Tiwari, Cornell University
• Victor Vartanian, ISMI
• Wilfried Vandervorst, IMEC
• Bettina Weiss, SEMI
• Ehrenfried Zschech, AMD