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Welcome

The Nanoscale and Optical Process Metrology Group develops, models, and applies laser methods to advance measurement sciences in emerging areas of nanoscale technologies, spectroscopic monitoring, and characterization of industrial processes and products. Develops experimental methods, theoretical and numerical models, and reference standards pertaining to the use of scattering and absorption spectroscopies in electronic device and sensor fabrication, chemical manufacturing processes, and analytic services; develops spectroscopic methods and disseminates reference data for measuring trace gas concentration in manufacturing processes and in telluric environments; performs experimental and numerical studies to elucidate the mechanisms of thermal reactive processes and aerosol growth and formation, and performs experiments to link electronic and structural properties of molecular aggregates and films to device and sensor performance.

Programs/Projects
Atomic Layer Deposition – Process Models and Metrologies — Atomic layer deposition (ALD) is increasingly being utilized to deposit the nanometer-scale, conformal layers that are required for many microelectronics applications, including high-k gate …
 
Instrument Standards for Detection of Hazardous Chemical Vapors — The overarching goal of this project is to develop and disseminate measurement tools to improve the accuracy and reliability of chemical measurements related to homeland security, e.g. measurements …
 
Spectroscopic Measurements of Atmospheric Gases for Monitoring Greenhouse Gases — Climate scientists are developing a new generation of spectrometers for the NASA-sponsored inventory of atmospheric greenhouse gases, most notably carbon dioxide. This inventory is critical to …