The Nanoscale and Optical Process Metrology Group develops, models, and applies laser methods to advance measurement sciences in emerging areas of nanoscale technologies, spectroscopic monitoring, and characterization of industrial processes and products. Develops experimental methods, theoretical and numerical models, and reference standards pertaining to the use of scattering and absorption spectroscopies in electronic device and sensor fabrication, chemical manufacturing processes, and analytic services; develops spectroscopic methods and disseminates reference data for measuring trace gas concentration in manufacturing processes and in telluric environments; performs experimental and numerical studies to elucidate the mechanisms of thermal reactive processes and aerosol growth and formation, and performs experiments to link electronic and structural properties of molecular aggregates and films to device and sensor performance. ![]() Atomic Layer Deposition – Process Models and Metrologies — Atomic layer deposition (ALD) is increasingly being utilized to deposit the nanometer-scale, conformal layers that are required for many microelectronics applications, including high-k gate …
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General Information: Roger D. van Zee 100 Bureau Drive, M/S 8360 |