Tong Zhang

Tong Zhang is a CNST/UMD Postdoctoral Researcher in the Electron Physics Group. He received a B.S. in Physics from Shandong University, China, and a Ph.D in Physics from the Institute of Physics at the Chinese Academy of Sciences. For his doctoral research, he used a low temperature scanning tunneling microscope to study surface states in topological insulators and to measure two-dimensional superconductivity in single layer metal films. At the CNST, Tong is working with Joseph Stroscio to optimize the growth of topological insulators by molecular beam epitaxy and then measure the unique properties of these materials with scanning probe microscopy and spectroscopy.

• Superconductivity in One-Atomic-Layer Metal Films Grown on Si(111), T. Zhang, P. Cheng, W.J. Li, Y.J. Sun, G. Wang, X.G. Zhu, K. He, L.L. Wang, X.C. Ma, X. Chen, Y.Y. Wang, Y. Liu, H.Q. Lin, J.F. Jia, and Q.K. Xue, Nature Physics 6, 104-108 (2010).
• Landau Quantization of Topological Surface States in Bi2Se3, P. Cheng, C.L. Song, T. Zhang, Y.Y. Zhang, Y.L. Wang, J.F. Jia, J. Wang, Y.Y. Wang, B.F. Zhu, X. Chen, X.C. Ma, K. He, L.L. Wang, X. Dai, Z. Fang, X.C. Xie, X.L. Qi, C.X. Liu, S.C. Zhang, and Q.K. Xue, Physical Review Letters 105, 076801 (2010).
• Experimental Demonstration of the Topological Surface States Protected by the Time-Reversal Symmetry, T. Zhang, P. Cheng, X. Chen, J.F. Jia, X.C. Ma, K. He, L.L. Wang, H.J. Zhang, X. Dai, Z. Fang, X.C. Xie, and Q.K. Xue, Physical Review Letters 103, 266803 (2009).