Michael Stocker

Michael Stocker is a CNST/UMD Postdoctoral Researcher in the Nanofabrication Research Group.  He received a B.S. in Chemistry from Wheaton College (Illinois) and a Ph.D. in Chemistry from the University of Maryland, College Park.  His doctoral research focused on using two-photon lithography to characterize the radical photoinitiators used for multiphoton absorption polymerization and on simulating the deactivation kinetics involved in resolution augmentation through photo-induced deactivation lithography. Michael is working with J. Alexander Liddle measuring photo-generated acid diffusion in chemically-amplified resists using super-resolution fluorescence microscopy. 
 

Selected Publications

• Elucidating the kinetics and mechanism of RAPID lithography, M. P. Stocker and J. T. Fourkas, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 824902 (2012).
• Multiphoton photoresists giving nanoscale resolution that is inversely dependent on exposure time, M. P. Stocker, L. Li, R. R. Gattass, and J. T. Fourkas, Nature Chemistry 3, 223–227 (2011).