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Adhesion Promoter (HMDS): YES 310TA

Description:

HMDS (hexamethyldisilzane) promotes photoresist adhesion by creating a bond between the resist and silicon.  The silizanes bond to the silicon in the wafer while the methyls bond with the photoresist.  Vapor priming allows for HMDS application in a monolayer and reduces the chance of contamination.

Specifications / Capabilities:

Quality of Coating

  • Surface dehydration and subsequent vapor priming results in chemical bonding to surface hydroxyl ions, not weakly bound surface moisture
  • Reesulting coatings are repeatable and stable for extended periods

 

Efficiency of Chemical Usage

  • Uses less than 5 ml to coat up to 200 wafers
  • System uses pure HMDS so there is no possibility of variation due to changes in carrier concentration

 

Waste Disposal

  • Virtually no waste - no liquid solvents or residues to dispose of

 

Flexibility of Substrate Size and Shape

  • Any size and shape substrate can be treated with equal efficiency up to 16"
  • There are no issues with flow effects or substrate topology due to use of vapor

 

Flexibility of Type of Substrate

  • Delicate or difficult substrates can be accommodated with simple temperature or recipie changes
  • With no substrate movement during priming, there is no risk of breakage or other damage

 

HMDS is stored in the system under vacuum

  • Chemical does not degrade from exposure to moisture in the air
  • Operators are not exposed to fumes from the HMDS or carrier solvent

Access Information:

Access to this tool requires that you have attended NanoFab safety orientation, passed the safety test, and have been properly trained on the tool.  If you have any questions, please contact the NanoFab User Coordinator, or the tool contact person.

NANOFAB USER MANUAL

SCHEDULE TRAINING

Operating Schedule:

Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday).  Out of hours access requires prior approval by the NanoFab Manager.

Contact

Name: Rich Kasica
Phone: 301.975.2693
Email: nanofab_litho@nist.gov
Address:
100 Bureau Drive, Stop 6201
Gaithersburg, MD 20899-6201