NIST logo
*
Bookmark and Share

Denton E-beam Evaporator #2

Description:

CORAL Name:  E-Beam Evap 2

This is an electron gun evaporator for the deposition of metals and dielectrics thin films. Materials available are: Ag, Al, Au, Co, Cr, Cu, Fe, Mo, Pd, Permalloy, Pt, Ta, Ti, W, Al2O3, MgO, Si, SiO2, TiO2.

Specifications / Capabilities:

  • Wafers from 50 to 150mm
  • Capacity: 4 wafers 
  • Cryopumped with a base vacuum of 8E-8T
  • Oxygen ion assisted deposition for dielectrics
  • Double-rotation planetary fixturing
  • Uniformity better than 3% over 100mm wafer
  • Restriction:  200nm maximum per layer

Scientific Opportunities / Applications:

  • Metallization for electrical contacts
  • Dielectric deposition
  • Dry etch masks
  • Lift-off process
  • Magnetic studies

Access Information:

Access to this tool requires that you have attended NanoFab safety orientation, passed the safety test, and have been properly trained on the tool. If you have any questions, please contact the NanoFab User Coordinator, or the tool contact person.

NANOFAB USER MANUAL

SCHEDULE TRAINING

therm_evap

Operating Schedule:

Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday).  Out of hours access requires prior approval by the NanoFab Manager.

Contact

Name: Gerard Henein
Phone: 301.975.5645
Email: nanofab_deposition@nist.gov
Address:
100 Bureau Drive, Stop 6201
Gaithersburg, MD 20899-6201