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PECVD: Unaxis 790

Description:

CORAL Name:  PECVD

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Specifications / Capabilities:

  • From small size samples to 200 mm wafers
  • No photoresist
  • No plastic or PDMS
  • Glass and Silicon Substrates allowed
  • All other substrates need approval

Scientific Opportunities / Applications:

  • Low temperature film deposition
  • Film types:  Silicon dioxide, silicon nitride, oxi-nitride, and polysilicon
  • Low stress films
  • Inter-level metal isolation
  • Masking layers

Access Information:

Access to this tool requires that you have attended NanoFab safety orientation, passed the safety test, and have been properly trained on the tool. If you have any questions, please contact the NanoFab User Coordinator, or the tool contact person.

NANOFAB USER MANUAL

SCHEDULE TRAINING

pecvd_furnace

Operating Schedule:

Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday).  Out of hours access requires prior approval by the NanoFab Manager.

Contact

Name: Jerry Bowser
Phone: 301.975.8187
Email: nanofab_furnaces@nist.gov
Address:
100 Bureau Drive, Stop 6201
Gaithersburg, MD 20899-6201