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Nano-Imprint Lithography: Nanonex NX-2000

Description:

CORAL Name:  Nanoimprinter

This tool creates a pattern in a thin resist by embossing from a mold.  The pattern is later transferred to the wafer by reactive ion etching.

Specifications / Capabilities:

  • Pieceparts up to 150 mm wafers
  • Nitrogen cushion pressure ensures uniformity
  • Imprint temperatures from room to 300 °C
  • Heating rate >5 °C/s
  • Cooling rate >2 °C/s
  • Capable of UV-curvable as well as thermoplastic resists
  • High throughput: capable of <60 s per wafer
  • Feature size down to 10 nm

Scientific Opportunities / Applications:

  • Nanoscale patterning
  • Polymer or Sol-gel nano device fabrication
  • Polymer property study

Access Information:

Access to this tool requires that you have attended NanoFab safety orientation, passed the safety test, and have been properly trained on the tool. If you have any questions, please contact the NanoFab User Coordinator, or the tool contact person.

NANOFAB USER MANUAL

SCHEDULE TRAINING

Nanonex NX-2000

Operating Schedule:

Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday).  Out of hours access requires prior approval by the NanoFab Manager.

Contact

Name: Lei Chen
Phone: 301.975.2908
Email: nanofab_litho@nist.gov
Address:
100 Bureau Drive, Stop 6201
Gaithersburg, MD 20899-6201