CORAL Name: JEOL E-beam
This system enables direct writing of advanced nanolithography patterns on wafers
Specifications / Capabilities:
- 25, 50, 100 kV accelerating voltage
- 2 nm minimum spot size
- 12 MHz scanning rate
- 19 bit DAC resolution
- 0.5 mm max write field (4th lens)
- 150 x 190 mm write area
- 0.62 nm stage movement precision
- <25 nm stitching & overlay accuracy
Access to this tool requires that you have attended NanoFab safety orientation, passed the safety test, and have been properly trained on the tool. If you have any questions, please contact the NanoFab User Coordinator, or the tool contact person.
Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday). Out of hours access requires prior approval by the NanoFab Manager.