Zeiss NVision 40 FIB

Description:

CORAL Name: ZEISS FIB

This workstation combines Focused Ion Beam and Gemini Scanning Electron Microscope colums to enable the study of nanoscale-level materials and physical failure analysis in industrial production as well as state-of-the-art research in Nanotechnology, Materials and Life Sciences

Specifications / Capabilities:

SEM Resolution: 1.1 nm @ 200kV, 2.5 nm @ 1kV
FIB Resolution: 4.0 nm @ 30kV
SEM Magnification: 30x - 900kx
FIB Magnification: 475x - 500kx
Gas Injection: 4 Channel
- Up to two different solid state precursors
- Up to four different gaseous or liquid precursors
- Wide range of precursors options including W, Pt, C, and silicon oxide insulator deposition
Detectors
- In-column EsB and BSE
- In-lens: SE detector
- Chamber: Everhart Thornley type SE detector
Chamber
- Two specimen exchange positions
- 7 additional available ports for upgrade options
3D Software for Image Reconstruction

Scientific Opportunities / Applications:

Nanometer scale patterning and etching of materials
Micromanipulation and TEM sample prep
Can accomodate substrates from smapp pieces to 100 mm wafers

Access Information:

Access to this tool requires that you have attended NanoFab safety orientation, passed the safety test, and have been properly trained on the tool. If you have any questions, please contact the NanoFab User Coordinator, or the tool contact person.

NANOFAB USER MANUAL

SCHEDULE TRAINING

Operating Schedule:

Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday). Out of hours access requires prior approval by the NanoFab Manager.

Contact

Name: Mike Hernandez
Phone: 301.975.4590
Email: nanofab_metrology@nist.gov
Address:
100 Bureau Drive, Stop 6201
Gaithersburg, MD 20899-6201