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CORAL Names: CMOS Wet Ox, CMOS Dry Ox, Boron Doping (P-type), Phos. Doping (N-Type)
This four-stack furnace bank is used for the thermal growth of silicon dioxide and diffusion by solid source.
Specifications / Capabilities:
Scientific Opportunities / Applications:
Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday). Out of hours access requires prior approval by the NanoFab Manager.
Name: Jerry Bowser