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Rapid Thermal Annealer: Modular Process Technology RTP-600x

Description:

CORAL Name:  RTA

This system uses 21-1200W lamps to control temperature ramps and steady state temperatures from 250 degrees to 1200 degrees C anneals

Specifications / Capabilities:

Silicon Wafers only

Scientific Opportunities / Applications:

  • Short time, high temperature anneals
  • Growth of Silicon Dioxide
  • Activate dopants after ion-implant
  • CVD gass reflows
  • Sintering

Access Information:

Access to this tool requires that you have attended NanoFab safety orientation, passed the safety test, and have been properly trained on the tool. If you have any questions, please contact the NanoFab User Coordinator, or the tool contact person.

NANOFAB USER MANUAL

SCHEDULE TRAINING

annealer

Operating Schedule:

Access to this machine follows standard NanoFab operating hours (7am - 7pm Monday - Friday).  Out of hours access requires prior approval by the NanoFab Manager.

Contact

Name: Jerry Bowser
Phone: 301.975.8187
Email: nanofab_furnaces@nist.gov
Address:
100 Bureau Drive, Stop 6201
Gaithersburg, MD 20899.6201