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The JEOL JBX 6300-FS direct write electron beam lithography system allows users to quickly and directly pattern a variety of substrate materials with feature sizes as small as 10 nm. The high precision stage provides excellent pattern stitching and can accommodate substrates ranging from 200 mm diameter wafers down to small pieces.
NEMO Name: JEOL E-beam
Location: Building 216 Rm. G107
Training Time: Depends on user experience and process requirements; typically 6 hours.