Take a sneak peek at the new NIST.gov and let us know what you think!
(Please note: some content may not be complete on the beta site.).
Laser Pattern Generator Now Available
For Immediate Release: June 11, 2009
CNST NanoFab Manager
The NanoFab has a new capability to enhance its prototype and proof-of-concept capabilities with a Heidelberg DWL-66FS Laser Pattern Generator designed for low volume mask making and direct writing. It is designed to write directly 1x1 to 6x6 inch square masks, with structures down to 0.6 micrometer linewidth. The Heidelberg is also capable of direct patterning on substrates up to 150mm in diameter. The tool accepts a wide variety of standard design files formats such as DXF, GDS-II, CIF, Gerber, STL formats.