The NanoLab: Current Measurement Research Areas
While the NanoFab provides access to state-of-the-art commercial tools, the CNST's NanoLab offers opportunities for researchers to collaborate on creating and using the next generation of nanoscale measurement instruments and methods by working directly with the CNST's multidisciplinary scientists and engineers. Based on the collective input of our stakeholders regarding the key measurement barriers to advancing nanotechnology towards production, and the current capabilities and needs of NIST’s four Laboratories, we are currently emphasizing the following three measurement research areas.
In support of continued growth in the electronics industry beyond complementary metal-oxide-semiconductor (CMOS) technology, CNST researchers are developing new methods to create and characterize devices, architectures and interconnects for graphene, nanophotonic, nanoplasmonic, spintronic, and other future electronics.
The Center is advancing the state of the art in nanomanufacturing by developing measurement and fabrication tools for both lithographic ("top-down") and directed assembly ("bottom-up") approaches.
The CNST is building a program that will create new methods for elucidating light-matter interaction, charge and energy transfer processes, catalytic activity, and interfacial structure in energy-related devices.
Although the measurement research staff is organized into three Groups, each researcher applies his or her multidisciplinary expertise across multiple areas. Note that the NanoFab is operated by its own dedicated staff of processing engineers and technicians. Although the NanoFab staff focus on training and supporting the facility users, running the tools, and establishing consistent baseline processes, the staff also participates in research in the course of developing new processes. Similarly, members of the research staff regularly apply their expertise to help evaluate and consult on NanoFab projects.