Lei Chen

Lei Chen is a Process Engineer in the NanoFab Operations Group.  He received a Ph.D. in Polymer Science and Engineering from Nanjing University in China, and then joined the university’s staff as an Associate Professor.  Upon arrival in the United States, Lei joined the Nanostructure Laboratory at Princeton University as a Research Associate, where he focused on novel nanofabrication technology development.  Following his time in academia, Lei moved to NanoOpto Corp., leading projects and process development for nano-optical devices. He has broad  experience in nanofabrication, self-assembled nanostructures, surface patterning, polymers, and nanocomposites, with over 60 publications and five patents.  Lei joined the CNST in 2007, where he is responsible for process development in nanoimprint lithography, plasma etching, atomic layer deposition, and nanostructure characterization.

• 58nm Half-Pitch Plastic Wire-Grid-Polarizer by Nano-Imprint Lithography, L. Chen, J. Wang, F. Waters, X. Deng, M. Buonanno, S.Tai, and X. Liu, Journal of Vacuum Science and Technology B 25(6), 2654 (2007).
• Defect Control in NanoImprint Lithography, L.Chen, X.Deng, J.Wang, K.Takahashi, F.Liu, Journal of Vacuum Science and Technology B 23(5/6), 2933 (2005).
• Resonant Grating Filters as Refractive Index Sensors for Chemical and Biological Detections, J.Wang, L.Chen, S.Kwan, F.Liu and X.Deng, Journal of Vacuum Science and Technology B 23,(5/6) 3006 (2005).
• Novel Polymer Patterns Formed by Lithographically Induced Self-Assembly, L. Chen, L. Zhuang, P. Deshpande and S. Chou, Langmuir 3(21), 818 (2005).
• Direct three-dimentional patterning using nanoimprint lithography, M. Li, L. Chen and S. Y.Chou, Applied Physics Letters 78(21), 3322 (2001).
• Kinetics and Mechanism of the Rod-to-Vesicle Transition of Block Copolymer Aggregates in Dilute Solution, L. Chen, H. Shen and A. Eisenberg, Journal of Chemical Physics B 103, 9488-9497 (1999).