Adam Berro

Adam Berro is a CNST Postdoctoral Researcher in the Nanofabrication Research Group.  He received a B.S. in Chemistry from the University of Michigan and a Ph.D. in Organic Chemistry from the University of Texas at Austin, where he worked with C. Grant Willson on the synthesis and characterization of photoacid generators and resist materials for use in double exposure lithography.  At the CNST, Adam is working with J. Alexander Liddle to develop fluorescence techniques for the measurement of acid diffusion in photoresists with single molecule resolution.

 

 

• Optical Threshold Layer and Intermediate State Two Photon PAG Approaches to Double Exposure Lithography, A. J. Berro, X. Gu, N. A. O'Connor, S.  Jockusch, T. Nagai, T. Ogata, P. A. Zimmerman, B. J. Rice, E. Adolph, T. Byargeon, J. Gonzalez, N. J. Turro, and C. G. Willson, Proceedings of SPIE The International Society for Optical Engineering 7273, 72731B (2009).
• Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography, N. A. O'Conner, A. J. Berro, J. R. Lancaster, S. Jockusch, T. Nagai, T. Ogata, S. Lee, P. A. Zimmerman, C. G. Willson, and N. J. Turro, Chemistry of Materials 20, 7374-7376 (2008).
• Anion Radical [2 + 2] Cycloaddition as a Mechanistic Probe: Stoichiometry- and Concentration-Dependent Partitioning of Electron-Transfer and Alkylation Pathways in the Reaction of the Gilman Reagent Me2CuLi×LiI with Bis(enones), J. Yang, D. F. Cauble, A. J. Berro, N. L. Bauld, and M. J. Krische, Journal of Organic Chemistry  69, 7979-7984 (2004).