TY  - JOUR
AU  - Bin Li
AU  - Zhiquan Luo
AU  - Paul Ho
AU  - Li Shi
AU  - Lew Rabenberg
AU  - JiPing Zhou
AU  - Richard Allen
AU  - Michael Cresswell
C2  - Nanotechnology
DA  - 2009-02-25 00:02:00
LA  - en
M1  - 20
PB  - Nanotechnology
PY  - 2009
TI  - Controlled Formation and Resistivity Scaling of Nickel Silicide Nanolines
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32991
ER  -