TY  - CONF
AU  - Benjamin Bunday
AU  - Thomas Germer
AU  - Victor Vartanian
AU  - Aaron Cordes
AU  - Aron Cepler
AU  - Charles Settens
C2  - Metrology, Inspection, and Process Control for Microlithography XXVII, San Jose, CA, US
DA  - 2013-04-10 00:04:00
DO  - https://doi.org/10.1117/12.2012472
LA  - en
M1  - 8681
PB  - Metrology, Inspection, and Process Control for Microlithography XXVII, San Jose, CA, US
PY  - 2013
TI  - Gaps Analysis for CD Metrology Beyond the 22 nm Node
ER  -