TY  - JOUR
AU  - Patrick Naulleau
AU  - Gregg Gallatin
C2  - Journal of Vacuum Science and Technology B
DA  - 2010-11-11 00:11:00
LA  - en
M1  - 28
PB  - Journal of Vacuum Science and Technology B
PY  - 2010
TI  - Effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905544
ER  -