TY  - JOUR
AU  - Ryan Koseski
AU  - William Osborn
AU  - Stephan Stranick
AU  - Frank DelRio
AU  - Mark Vaudin
AU  - Thuy Dao
AU  - Vance Adams
AU  - Robert Cook
C2  - Journal of Applied Physics
DA  - 2011-10-11 00:10:00
LA  - en
PB  - Journal of Applied Physics
PY  - 2011
TI  - Micro-scale measurement and modeling of stress in silicon surrounding a tungsten-filled through-silicon via
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=908908
ER  -