TY  - CONF
AU  - N. Sullivan
AU  - Ronald Dixson
AU  - B Bunday
AU  - M Mastovich
AU  - P Knutruda
AU  - P Fabre
AU  - R Brandoma
C2  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, Editor, Santa Clara, CA, USA
DA  - 2003-05-01 00:05:00
LA  - en
M1  - 5038
PB  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XVII, Daniel J. Herr, Editor, Santa Clara, CA, USA
PY  - 2003
TI  - Electron Beam Metrology of 193 nm Resists at Ultra Low Voltage
ER  -