TY  - CONF
AU  - B Bunday
AU  - M Bishop
AU  - John Villarrubia
AU  - Andras Vladar
C2  - Proceedings of SPIE, Process and Materials Characterization and Diagnostics in IC Manufacturing, Kenneth W. Tobin, Jr., Iraj Emami, Editors, Santa Clara, CA, USA
DA  - 2003-07-01 00:07:00
LA  - en
M1  - 5041
PB  - Proceedings of SPIE, Process and Materials Characterization and Diagnostics in IC Manufacturing, Kenneth W. Tobin, Jr., Iraj Emami, Editors, Santa Clara, CA, USA
PY  - 2003
TI  - CD-SEM Measurement of Line Edge Roughness Test Patterns for 193 nm Lithography
ER  -