TY  - JOUR
AU  - H. Li
AU  - Ronald Ono
AU  - Leila Vale
AU  - David Rudman
AU  - Sy-hwang Liou
C2  - Applied Physics Letters
DA  - 1996-10-01 00:10:00
LA  - en
M1  - 69
PB  - Applied Physics Letters
PY  - 1996
TI  - A Novel Multilayer Circuit Process Using YBa<sub>2</sub>Cu<sub>3</sub>O<sub>x</sub>/SrTiO<sub>3</sub> Thin Films Patterned by Wet Etching and Ion Milling
ER  -