TY  - CONF
AU  - Thomas Germer
AU  - Heather Patrick
C2  - Metrology, Inspection, and Process Control for Microlithography XXIV, San Jose, CA
DA  - 2010-03-01
LA  - en
PB  - Metrology, Inspection, and Process Control for Microlithography XXIV, San Jose, CA
PY  - 2010
TI  - Effect of Bandwidth and Numerical Aperture in Optical Scatterometry
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905013
ER  -