TY  - CONF
AU  - Ravikiran Attota
AU  - John Kramar
C2  - SPIE Advanced Lithography, San Jose, CA
DA  - 2016-03-25
LA  - en
PB  - SPIE Advanced Lithography, San Jose, CA
PY  - 2016
TI  - Optimizing noise for defect analysis with through-focus scanning optical microscopy
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=920308
ER  -