TY  - CONF
AU  - Andras Vladar
AU  - John Villarrubia
AU  - Michael Postek
C2  - Metrology, Inspection and Process Control for Microlithography | 17th | Metrology, Inspection and Process Control for Microlithography XVII | SPIE
DA  - 2003-06-01
LA  - en
M1  - 5038
PB  - Metrology, Inspection and Process Control for Microlithography | 17th | Metrology, Inspection and Process Control for Microlithography XVII | SPIE
PY  - 2003
TI  - A New Way of Handling Dimensional Meaurement Results for Integrated Circuit Technology
ER  -