TY  - CONF
AU  - Charles Tarrio
AU  - Thomas Lucatorto
AU  - S Grantham
AU  - M Squires
AU  - Uwe Arp
AU  - Lu Deng
C2  - Emerging Lithographic Technologies V, Santa Clara, CA
DA  - 2001-12-01
LA  - en
M1  - 4506
PB  - Emerging Lithographic Technologies V, Santa Clara, CA
PY  - 2001
TI  - Upgrades to the NIST/DARPA EUV Reflectometry Facility
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=841579
ER  -