TY  - JOUR
AU  - Quandou Wang
AU  - Ulf Griesmann
C2  - Optical Engineering
DA  - 2013-10-23
LA  - en
PB  - Optical Engineering
PY  - 2013
TI  - A versatile bilayer resist for laser lithography at 405 nm on glass substrates
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=913532
ER  -