@article{842396,
  author = {Bin Li and Zhiquan Luo and Paul Ho and Li Shi and Lew Rabenberg and JiPing Zhou and Richard Allen and Michael Cresswell},
  title = {Controlled Formation and Resistivity Scaling of Nickel Silicide Nanolines},
  year = {2009},
  number = {20},
  month = {2009-02-25 00:02:00},
  publisher = {Nanotechnology},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32991},
  language = {en},
}