@article{827401,
  author = {Patrick Naulleau and Gregg Gallatin},
  title = {Effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer},
  year = {2010},
  number = {28},
  month = {2010-11-11 00:11:00},
  publisher = {Journal of Vacuum Science and Technology B},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=905544},
  language = {en},
}