@conference{771466,
  author = {B Bunday and M Bishop and John Villarrubia and Andras Vladar},
  title = {CD-SEM Measurement of Line Edge Roughness Test Patterns for 193 nm Lithography},
  year = {2003},
  number = {5041},
  month = {2003-07-01 00:07:00},
  publisher = {Proceedings of SPIE, Process and Materials Characterization and Diagnostics in IC Manufacturing, Kenneth W. Tobin, Jr., Iraj Emami, Editors, Santa Clara, CA, USA},
  language = {en},
}