@conference{63726,
  author = {Liangchun Yu and Kin Cheung and Jason Campbell and John Suehle and Kuang Sheng},
  title = {Oxide Reliability of SiC MOS Devices},
  year = {2008},
  month = {2008-10-12},
  publisher = {2008 IEEE International Integrated Reliability Workshop, South Lake Tahoe, NV},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=900182},
  language = {en},
}