@article{24016,
  author = {Daniel Josell and John Bonevich and Thomas Moffat},
  title = {Iridium Barriers for Direct Copper Electrodeposition in Damascene Processing.},
  year = {2006},
  month = {2006-10-01},
  publisher = {Electrochemical and Solid State Letters},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=901778},
  language = {en},
}