@conference{190866,
  author = {James Potzick and J Pedulla and Michael Stocker},
  title = {New NIST Photomask Linewidth Standard},
  year = {2002},
  number = {4889},
  month = {2002-12-01},
  publisher = {Proceedings of SPIE, 22nd Annual BACUS Symposium on Photomask Technology, Brian J. Grenon, Kurt R. Kimmel, Editors, Monterey, CA},
  language = {en},
}