@conference{188801,
  author = {James Potzick},
  title = {Accuracy Differences Among Photomask Metrology Tools and Why They Matter},
  year = {1998},
  number = {3546},
  month = {1998-12-01},
  publisher = {Proceedings of SPIE, 18th Annual BACUS Symposium on Photomask Technology and Management, Brian J. Grenon, Frank E. Abboud, Editors, Redwood City, CA},
  language = {en},
}