@article{10876,
  author = {Quandou Wang and Ulf Griesmann},
  title = {A versatile bilayer resist for laser lithography at 405 nm on glass substrates},
  year = {2013},
  month = {2013-10-23},
  publisher = {Optical Engineering},
  url = {https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=913532},
  language = {en},
}